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INTRODUCTION

T&C Power Conversion, Inc. is focused on the RF digital future, building on a proud heritage of leadership of industrial solid state RF Generators and Amplifiers for the Ultrasonics, MRI, NMR, Spectroscopy, Broadcast Communications, EMC testing, Thin Film Deposition, CVD, PVD, gas plasma generation and general laboratory markets for more than 15 years. Beginning with the advent of RF Power Systems, the T&C Power Conversion name has been synonymous with quality and innovation. A pioneer in RF design technology, T&C Power Conversion has invented countless industry-leading developments, including nanosecond blanking circuitry used in gas plasma generation applications, the microsecond test HV RF Generator for Cyanogen testing, and the finest reflectometer system using state of the art RF designs combined with digital technology.

THE EARLY YEARS

T&C Power Conversion, Inc. got its start in 1993 when a young RF Engineering enthusiast set up a "factory" on a kitchen table in Rochester, NY and began providing engineering services to others in the local area. T&C Power Conversion, Inc. was incorporated in 1993.

In early 1995, the industry began to grow as did the business, so the company moved into its first Industrial Center to expand its first product line of FM stereo amplifiers and transmitters.

The young company's early accomplishments included the world's first solid state microsecond fast HV Generator system for Cyanogen testing (1996). The AG0201 HV system created the means to test lamps accurately throughout the complete process. T&C's famous slogan, "We Build Quality First" was first used in 1994.

Founded on RF engineering principles, T&C Power Conversion soon became a recognized worldwide leader in broadband RF power amplifier developments, such as the introduction of the new linear Class A/B RF Ultra and LA amplifier lines (1999). T&C became the selected supplier of RF amplifiers to Bruker Daltronics Mass Spectrometry systems (2000). In 2001, T&C continued to pioneer a multiple use AG Series amplifier/generator line of products for such applications as medical treatments used in "High Intensity Focused Ultrasound". This ground breaking method of treatment worldwide, excels the family of products into a power house of available models and options suitable for the most advanced applications.

 

TODAY AND TOMORROW
T&C launched a major literature and web site revitalization program in 2006, updating its logo and creating a new marketing campaign designed to introduce the company and its products to a new generation of appealing show attendees at Society of Vacuum Coaters Conference (SVC), Semicon West, and Semicon Europa.

2007 marked a new beginning for T&C as the company began to reposition its brand and building on its technology and distribution strengths. T&C launched its first major national stocking facility in Taiwan completing the supply chain links in the Asian Pacific Markets. The dramatically different campaign spotlighted T&C's state-of-the-art 13.56 MHz, 380 kHz and 450 kHz generators, as a major source in the spirited market place. Boldly setting the pace in the field of RF Plasma Generator technology, T&C invented the fastest nanosecond blanking circuitry available in RF Plasma Generators in the world. As a result, T&C launched a new RF Plasma Generator series (2005).

Building on its 2005 transformation into the RF Plasma Generator sources, T&C is making a bold statement with a comprehensive family of digital interfaced products. With the industry's most aggressive approach to blanking technology, T&C's 2005 product line comprises more than 75 percent digital interfaces-reflecting the powerful combination of the company's leadership in Ultrasonics, MRI, NMR, Spectroscopy, Broadcast Communications, EMC testing, Thin Film Deposition, CVD, PVD, gas plasma generation and general laboratory market technology strengths.

Today, building on more than 15 years of innovation, quality and industry leadership, T&C is a strong competitor, committed to leadership in the RF Designed technologies of tomorrow.

 
         
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